Male, doctor, researcher, doctoral supervisor, senior member of China Mechanical Engineering Society, national project peer review expert. Major: applied chemistry, nano-tribology. The main research directions are nano-polishing materials, atomic level surface planarization technology and chemical mechanical polishing (CMP) technology. He has successively undertaken more than ten scientific research projects such as major research projects of the National Natural Science Foundation, general projects of the National Natural Science Foundation, sub-projects of the National 973 Program (participation), Shanghai Natural Science Foundation, and Shanghai Nano Project. He has published more than 40 papers, of which more than 20 are included in SCI and EI***. 4 invention patents were authorized and 4 patents were applied. As the main backbone, he won the second prize of National Science and Technology Progress Award 1 (ranked fifth) in 2008, the excellent thesis award of China Mechanical Engineering Society (first author) in 2007, and the first prize of Science and Technology Progress Award of Ministry of Education in 2005 (ranked fifth). In the field of computer hard disk CMP technology research, it ranks at the current international advanced level.