1, technical breakthrough: The continuous breakthrough of mask aligner exposure technology has enabled mask aligner exposure technology to reach nanometer resolution and greatly improved the manufacturing accuracy of the chip.
2. Efficient production: mask aligner is a high-precision equipment, and its manufacturing process needs high precision and stability. By introducing automatic production line, we can realize efficient production in mask aligner and improve production efficiency and quality. For example, the automatic alignment system in mask aligner production line can automatically adjust the position of photoresist, which greatly improves the production efficiency and accuracy.
3. Chip manufacturing process optimization: The chip manufacturing process is continuously optimized. By improving the manufacturing process and parameter setting in mask aligner, the production efficiency and quality can be improved. For example, by optimizing photoresist formula and exposure parameters, higher resolution and faster production speed can be obtained.